Academic Open Internet Journal

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Volume 11, 2004

 

PREPARATION AND OPTICAL PROPERTIES CADIMUM CHLORIDE THIN FILMS PREPARED BY SOLUTION GROWTH TECHNIQUE.

 

F. I. EZEMA

fiezema@yahoo.com

DEPARTMENT OF PHYSICS AND ASTRONOMY,
UNIVERSITY OF NIGERIA, NSUKKA, ENUGU, NIGERIA.

 

ABSTRACT  

Cadmium chloride (CdCl2) thin films were prepared by solution growth technique from chemical baths containing solutions of cadmium acetate, ammonia and potassium chloride with NH3 as complexing agent. The effects of varying dip times on the optical properties of the film and the influence on the growth rate were studied. Our reasonably inexpensive and simple solution growth technique has been found suitable in obtaining halide thin films with reasonably satisfactory properties. The film properties studies are chemical composition and absorbance/transmittance. Other properties deduced from absorbance/transmittance include refractive index (n), which has been obtained in the average range between 2.15 and 2.70, extinction coefficient (k) ranges between 1.40 x 10-2 and 5.50 x 10-2 and optical conductivity (s) ranges between 2.13 x 1013S-1 and 8.07 x 1013 S-1. Thickness in the range between 0.150 and 0.611mm has been deposited. Some of the films were found to have very high absorbance in UV- VIS- NIR regions while the films absorbance increases as thickness increases hence they could find applications in solar radiation absorbers for solar cell fabrications.

Keywords: solution growth technique, CdCl2, solar cells

 

 

 

INTRODUCTION

            The solution growth technique (SGT) has been effectively used in the deposition of oxide, chalcogenide and even ternary compound thin films and the chemical reactions involved well understood (Chopra and Das 1983, Eze and Okeke 1997). The use of solution growth technique for the production of halide and halcogenate thin films has not been well documented. The conventional methods for the deposition of halide and halcogenate thin films have been   chemical vapour technique and spray pyrolysis (Chopra and Das 1983). In solution growth technique, ions rather than atoms or molecules are the building blocks and most first row metallic (alkali) halides such as K and Na halides which form part of the deposition bath are ionic halides and easily form ionic (conducting) solutions in water according to the reactions:

KCl + H20                K+ + Cl- + KOH

This enhances quick release of the halide ions, which react with the desired metallic ions without an applied external force. The alkali halides are abundant, cheap and easily available.

            The metallic ions needed for reaction with halide ions are easily provided from a nitrate or suphate or higher oxidation state halide salt of desired metal base. There salt are easily obtained and most of them are soluble in water at ordinary temperature or upon little heating (Lange 1973) to form acidic solutions and / or a complex.

The cations can be released upon the addition of a base such as NH4OH. The cation can be released as a free ion in the presence NH4OH according to the reaction

 

The released cations can now react with the halogen ions from alkali halide salt to form the desired metal halide molecule. This is because the NH4OH ensures a slow release of the metal ions in the solution. To produce CdCl2 thin films, the reaction bath constitutes cadmium acetate [Cd(CH3OO)2], Ammonium solution (NH3) as a complexing agent, potassium chloride (KCl) and distilled water. The film growth takes place through ion – by- ion condensation of Cd2+ and Cl- ions on the glass substrate when Cd2+ and Cl- ions exist over the solubility limit (Choi et al 1998).

            The deposition of cadmium chloride was based the reaction between NH3 as complexing of Cd2+ and KCl.

            The reactions involved in the deposition process are as follows:

            Cd(CH3COO)2 + NH3               Cd(NH3)4 (CH3COO)2

The right hand side of the above equation is cadmium ions in solution.

[Cd(NH3)4](CH3COO)2                       Cd2+ +4NH3 + (CH3COO)2

                            2KCl                        2K + Cl-

                        Cd2+ + Cl-                    CdCl2

The Cl- ions are released by the hydrolysis of KCl but Cd2+ ions from tetra amine cadmium (II) complex ions by combining with NH3 in alkaline solutions (pH10-11). These Cd(NH3)42+ complexes adsorb on the glass substrate, then a heterogeneous nucleation and growth takes place by ionic exchange with Cl- ions. This process is called an ion-by-ion process (Choi et al, 1998) and in this manner CdCl2 is deposited in form of whitish, uniform and adherent films at above 12hours dip times although deposition of the film started before 1hour dip times.

The optical properties of the film studied include the Absorbance, Transmittance and Reflectance, which were used to calculate the other properties such as refractive index, extinction coefficient, dielectric constant and optical conductivity. The optical properties and band gap of the film were deduced from equations given in literatures (Pankove 1971, Janai et al, 1979, Ndukwe, 1996, Ezema and Okeke, 2003) while optical method (Theye, 1985) was used to estimate the thickness of the film.

EXPERIMENTAL DETAILS

The depositions of cadmium chloride films were based on the reaction between tetra amine cadmium (II) compex and potassium chloride in cold water. The film growth reaction baths were made up of cadmium acetate Cd(CH3COO)2, ammonium solution(NH3) as a complexing agent and potassium chloride (KCl) solutions added into 50ml beakers in that order, which were stired thoroughly using glass rod at each stage to obtain a homogenous mixtureof the solutions. Each bath was made up to 40ml with distilled water and allowed to stay between 1 and 30 hours dip times.

The variation of the bath composition and concentration is shown in table I below:

Table1: Variation of the Bath Composition and Concentration.

Reaction bath

Dip time (hr)

Cd(CH3OO)2

NH3

KCl

H2O

pH

Mol. (M)

Vol. (ml)

Mol. (M)

Vol. (ml)

Mol. (M)

Vol. (ml)

Vol. (ml)

a241

24

1.0

10

10

10

1.0

10

10

10.2

a24

24

1.0

5

10

5

1.0

5

25

10.2

a12

12

1.0

5

10

5

1.0

5

25

10.2

a8

1

1.0

5

10

5

1.0

5

25

10.2

a7

2

1.0

5

10

5

1.0

5

25

10.2

a4

3

1.0

5

10

5

1.0

5

25

10.2

a3

4

1.0

5

10

5

1.0

5

25

10.2

a2

7

1.0

5

10

5

1.0

5

25

10.2

a1

8

1.0

5

10

5

1.0

5

25

10.2

 

CdCl2 films were deposited on 26mm x 76mm x 1mm commercial microscopic glass slides at initial bath solution pH value 10.2. The glass slides were previously degreased in nitric acid for 48 hours, cleaned with detergent, rinsed with distilled water and drip dried in air. The glass substrates were then inserted and suspended vertically from synthetic foam, which cover the beakers containing the solutions. After the dip times, the glass substrates were withdrawn rinsed and dip-dried in air. The films were characterized for the absorbance, transmittance and reflectance characteristics using PYE UNICAM UV SP8-100 spectrophotometers in the UV- VIS- NIR regions. The use of single bean Fourier transform spectroscopy involves dissolving the films in nujol to determine the peaks in the far infrared regions.

RESULTS AND DISCUSSION


Figure 1 shows the combined effect of film – nujol system on transmittance of infrared for CdCl2 when compared with nujol. The blank background of infrared spectroscopy for nujol  indicates the peaks at 1377cm-1, 146cm-1, 2855cm-1, 2924 cm-1, 2953cm-1, and 3436cm-1 with percentage transmittance between 5 and 57%.

 


           


When the film was dissolved in nujol, it showed other peaks at 1156cm-1, 1035cm-1, 859cm-1, and 540cm-1 with percentage transmittance between 54 and 66% which resulted due to the dissolved film. However dissolving the film in nujol modified the nujol peaks with modified nujol peaks showing percentage transmittance that ranged between 33 and 53%.


 The transmittance of the film with regard to nujol peaks before dissolving the film and the new peaks after dissolving the film shows percentage transmittance ranged between 4 and 27%.  Comparing the nujol spectra to that after dissolving of the film in the nujol that is the nujol – film spectra, the percentage transmittance after dissolving of the film is less than that before dissolving of the film.  This means that the film suppresses transmittance within the far infrared regions.  The poor transmission of infrared radiation by this film show that is can be used to screen off the heating portion of the solar radiation when used as coating on windows. Szatra et al ( 1991) reported that characteristic absorption bands from 710-400cm-1 are due to bonds of heavier element O-CI; hence 540cm-1 (figure 1) is due to O-CI.  According to Conley (1966), CIO3-  characteristic absorption bands occur from 985-923cm-1 , 662-646cm-1  and 539-477cm -1, and CIO4- characteristic absorption bands from 1108-1062cm-1 and 662-646cm-1, which were not incorporated in the film.NH4+ characteristic absorption bands occur from ranges between 3323 - 3015cm-1    and 1477- 1400cm-1 (Conley ,1966).  The peak 1454cm-1 in the range between 1477 and 1400cm-1 is as a result of nujol peak modification. The water of crystallization characteristic absorption bands occur from peaks (Conley, 1966) between ranges 3554 - 3139cm-1 and 1692 - 1600cm-1, therefore 3437cm-1 peak in the range between 3554 and 3139cm-1 is also as a result of nujol peak modification, which shows the absence of the water of crystallization. The spectral absorbance of cadmium chloride grown under varying conditions at 300K is displayed in figure 2. Samples al and a12 absorbed heavily


 

 

 

 

 

 

 

 

 

throughout the UV-VIS-NIR regions, samples a2 and a3 absorb moderately throughout UV-VIS-NIR regions and samples a4, a5, and a7 absorb poorly throughout UV-VIS-NIR regions.  All the samples show absorption peak values between 280 and 380 from where they decreased to low values towards the NIR regions.  The high absorbance in the UV-VIS-NIR regions exhibited by samples a1 and a12 show they could be


effective for solar radiation absorbers for solar cell fabrications. 


From the spectral absorbance we observe that as the dip times increases the deposited film absorbs heavily although there is no appreciable difference in absorption within the first three hours. Figure 3 shows the spectral transmittance – reflectance of CdCI2. 


Samples a4, a7 and a8 show high transmittance in the VU-VIS-NIR regions ranging between 76 and 86% after the fundamental absorption region while exhibiting poor reflectance ranging between 8 and 11%.  The high transmittance and poor reflectance exhibited throughout UV-VIS-NIR regions by these samples show that they have potential applications in the area of antireflection coatings and thermal control coatings for cold climates. Samples a2 and a3 show moderate transmittance in the UV-VIS-NIR regions ranging between 51 and 71% while exhibiting high reflectance throughout UV-VIS-NIR regions, which averages between 14 and 20%. 


 

 

 

 

 

 

The films with moderate transmittance in UV-VIS regions could be used as antidazzling coating for windscreen of a car.  Samples a1 and a12 show poor transmittance which range between 14 and 54% throughout within the VIS-NIR while exhibiting high reflectance, which averages between 18 and 20% within VIS-NIR regions.        


Figure 4 gives the variation of a with hn studied for CdCI2 samples.


 There are absorption edges, which are characteristics of the crystalline state of the film.


It can be seen from Figure 4 that the absorption edge shifted to shorter or higher wavelength regions depending on the variation in the dip times. 


For examples the dip times of 3 and 4 hours shifted the absorption edge to the shorter wavelength regions, while the dip times of 12 hours shifted the absorption edge to the higher wavelength regions.


            The region of higher values of a that is a > 10cm-1 correspond to transmittance between extended state in both valence and conduction bands.  The region of lower values of a that is a< 10cm-1 is the region where absorption presents roughly exponential behavior (Kotkata et al, 1994, Fayek et al, 1995).

            The usual method for determining the values of Eg involves plotting of (ahn)n  against hn.  If the appropriate value of n is used, the value of Eg will be given by the intercept on the hn axis.  These result were found for n = ½ for direct photon transitions as shown in Figure 5.  

 

              

 

 

 

 

 

 

 

It can be seen (Figure 5) that the Eg decreased depending on the variation in the dip times, which also depends on the thickness of the film.  The band gaps were found to range between 0.5 and 2.45eV.

            The values of refractive index (n) calculated from R and T data are plotted in figure 6 as a function of photon energy (hn).  At the lower energies for samples a3 and a4, n increases with increasing wavelength to peak values of 2.22 and 2.17 respectively then decreases with increasing wavelength.

            Sample a12 decreases from 2.28 at the low energy to a minimum of 0.94 at the high energy and increases with increasing wavelength at the same region.  Sample a1 shows peak at 4.14eV while a2, a3 and a7 show minima at the same point.

            The values of extinction coefficient (k) calculated from R and T data are plotted in figure 7 as a function of photon energy (hn). 

          

     

 

 

 

 

 

 

 

All the samples show similar spectral curve except a12, which showed some irregularities at the low energies.  As the dip time increased the k values increased.

The plots of er against hn are displayed in Figure 8.  At the lower energies for samples a3 and a4, er increases with increasing wavelength to peak values of 4.93 and 4.70 respectively then decreases with increasing wavelength.  Samples a12 decreases from 5.20 at the low energy to a minimum of 0.88 at the high energy and increases with wavelength at the same region.

Sample a1 shows peak at 4.14eV while a2, a3 and a7 show minima at the same point.  It can be seen that the shapes of spectral curves for n (figure 6) and that of er (figure 8) are strikingly similar.

            The plots of ei against hn are displayed in Figure 9. All the samples show similar spectral curve except a12, which showed some irregularities at the low energies.  However, ei decrease from high values at low energy to low values at the high-energy regions.

           

 

 

 

 

 

 

 

 

 

The plot of optical conductivity (so) against hv is shown in figure 10. Samples a1, a3, a4 and a12 show so increases from minimum to maximum values between 3.25 x 10 S-1 and 5.95 x 10 S-1 and then decreased to low values.


 

 

 

 

 

 

 

 

 

CONCLUSION

Thin film of CdCl2 with thickness 0.150-0.611um has been successfully deposited using solution growth technique. The film was characterized using FTIR spectroscopy for composition while spectrophotometer was used to deduce the optical properties such absorbance/transmittance/reflectance


from which other optical properties such refractive index, extinction coefficient, dielectric constants and optical conductivity were calculated. Some of the films were found to have high absorbance in the UV-VIS-NIR regions, hence, they could be effective for solar radiation absorbers for solar cell fabrications, those which show moderate transmittance in the UV-VIS regions could be used as antidazzling coating for car windscreen while those with high transmittance and low reflectance could be used as antireflection coating as well as thermal control coating for cold climates.

REFERENCES

Choi J.Y., K.J. Kim, J.B. Yoo and D. Kim (1998), Properties of Cadmium Sulphide    Films Deposited by Chemical Bath Deposition with ultrasonication, Solar Energy 64 (1-3), 41

 

Conley, R.T., (1966), infrared spectroscopy, Allyn and bacon Inc, Boston.

 

Ezema F.I. and Okeke C.E, 2003, “Chemical Bath Deposition of Bismuth Oxide (Bi2O3) Thin Film and Its Application”, Greenwich Journal of Science and Technology 3(2) 90.

 

Ezema F.I. and Okeke C.E., 2003, “Chemical Bath Deposition Of Beryllium Sulphide Thin Film And Its Applications” Academic Open Internet Journal www.acadjournal.com vol. 9

 

Fayek, S.A., M. Elocker, S.S. Fouad, M.H. El – Fouly and G.A. Amim (1995), “The effect of Thickness and g - Radiation on the Optical Properties of Thin (As2S3)1–xInx Amorphous Film,” J. Phys. D: Appl. Phys.28, 2150.

 

Janai, M., D.D. Alfred, D.C. Booth and B.O. Seraphin (1979), “Optical Properties and    Structures of Amorphous Silicon Films Prepared by CVD”, Sol. Ener. Mater. 1,11.

 

Kotkata, M. F., H.T.El-Shair, M.A. Afifi and M.M.A. Azizi, (1994), “Effect of Thallium on the Optical Properties of Amorphous Gese2 and Gese4 Films,” J. Phys. D: Appl. Phys.27, 623.

 

 Lange,N.A.,(1973), Lange’s Handbook of Chemistry, 11th edn, McGraw-Hill Book Co.,New York. 

 

Ndukwe, I.C. (1996), “Solution Growth, Characterization and Applications of Zinc Sulphide Thin Films”, Sol. Ener. Mater. Sol. Cells 40, 123.

 

 Pankove, J.I. (1971), Optical Processes in Semiconductors, Prentice-Hall, New York.

 

Szafran, Z.N., R.M. Pike, and M.M. Sigh, (1991), Microscale inorganic Chemistry, A comprehensive laboratory Experience, John Wiley and Sons Inc. New York.

 

Theye, M. (1985), In “Optical Properties of Thin Films”, K.L. Chaopra and L.K.

Malhota, eds, thin film technology and Applications, Tata McGraw-Hill, New Delhi.

 

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